Photo-deprotection patterning of self-assembled monolayers

Photo-deprotectable self-assembled monolayers (SAMs) provide a versatile platform for creating functional patterned surfaces. In this study, we present nanoscale photo-patterning, multi-component patterning, and a method for producing molecular gradients using photo-deprotectable SAMs. Nanoscale patterning of photo-deprotectable SAMs was achieved by coupling a UV laser (365 nm) through a scanning near field probe to produce nanoscale lines of ～40 nm, i.e. λ/9. Multi-component patterning was achieved by a two-stage method combining both microcontact printing and soft-UV photo-patterning. The example demonstrated in this study produced a three-component patterned surface with regions of CF₃, CH₃ and COOH/CF₃ functionality. The versatility of these photocleavable SAMs is further demonstrated by creating linear molecular gradients of two functionalities along a distance of ～25 mm. The use of ‘soft’ UV gives several advantages including the ability to pattern SAMs with micron-scale features over large areas quickly, with greater control over the photochemical reactions, and compatibility with existing lithographic facilities thus offering an effective alternative to other patterning methods such microcontact-printing or deep UV patterning.     

Integrated ozone–photo–Fenton process for the removal of pollutant from industrial wastewater

The use of hybrid advanced oxidation processes(AOPs) for the removal of pollutants from industrial effluents has been extensively studied in recent literature. The aim of this study is to compare the performance of the photo,Fenton, photo-Fenton and ozone–photo–Fenton processes in terms of color removal and chemical oxygen demand(COD) removal of distillery industrial effluent together with the associated electrical energy per order. It was observed from the experimental results that the O_3/UV/Fe~(2 +)/H_2O_2 process yielded a 100% color and95.50% COD removals with electrical energy per order of 0.015 k W·h·m~(-3) compared to all other combinations of the AOPs. The effects of various operating parameters such as H_2O_2 and Fe~(2+) concentration, effluent pH, COD concentration and UV power on the removal of color, COD and electrical energy per order for the ozone–photo–Fenton process was critically studied and reported. The color and COD removals were analyzed using a UV/Vis spectrometer and closed reflux method.     

Exciton-induced degradation of organic/electrode interfaces in ultraviolet organic photodetectors

We study the degradation mechanisms of ultraviolet (UV) organic photodetectors (OPDs). Contrary to expectations, we determine that the bulk of the organic layers in UV OPDs is stable under prolonged UV irradiation, showing no detectable changes in photophysical characteristics such as photoluminescence yield and exciton lifetime and thus not contributing to the observed degradation behavior of UV OPDs. However, the results show that the organic/electrode interfaces in UV OPDs, including indium tin oxide (ITO)/organic and organic/metal ones, are susceptible to UV irradiation, leading to a deterioration in both charge injection and extraction across the interfaces. The degradation of the organic/electrode interfaces in UV OPDs is essentially induced by UV-generated excitons in their vicinity and may be responsible for nearly 100% of the photo-current loss of UV OPDs. Approaches for improving the photo-stability of organic/electrode interfaces, and thus the lifetime of UV OPDs, are also investigated. We demonstrate that the use of thin (∼0.5 nm) interfacial layers such as lithium acetylacetonate at organic/metal interfaces can significantly reduce the interfacial degradation, and the use of appropriate hole transport materials such as N,N′-bis (naphthalen-1-yl)-N,N′-bis(phenyl) benzidine at ITO/organic interfaces can greatly improve the interfacial photo-stability.     

Spontaneous emission from a three-level atom placed in three-dimensional photonic crystals in the long-time limit

The paper describes the spontaneous emission from a three-level atom placed in a periodic dielectric microstructure which exhibits a complete three-dimensional photonic band gap. By using the Euler approach, the upper level population of the atom is calculated for a wide range of relationships between the Rabi frequency and the detuning of the atomic transition frequency from the upper band edge. The results indicate that there are three cases of the relationship between Rabi frequency and detuning, which determine distinctive states of the atomic population in the long-time limit. When the detuning is greater than the Rabi frequency, the upper level has a zero steady-state atomic population, which leads to enhancement of spontaneous emission. When the magnitude of the detuning is less than the Rabi frequency, the upper level has a nonzero steady-state atomic population, which leads to suppression of spontaneous emission. When the negative detuning is greater than the Rabi frequency, the upper level has a nondecaying oscillatory-state atomic population due to long-time atomic splitting. These three properties of the spontaneous emission are relevant to several optical devices on an atomic scale, such as optical memories, switches and clocks.     

The Involvement of Xanthone and (E)-Cinnamoyl Chromophores for the Design and Synthesis of Novel Sunscreening Agents

Excessive UV exposure contributes to several pathological conditions like skin burns, erythema, premature skin aging, photodermatoses, immunosuppression, and skin carcinogenesis. Effective protection from UV radiation may be achieved with the use of sunscreens containing UV filters. Currently used UV filters are characterized by some limitations including systemic absorption, endocrine disruption, skin allergy induction, and cytotoxicity. In the research centers all over the world new molecules are developed to improve the safety, photostability, solubility, and absorption profile of new derivatives. In our study, we designed and synthesized seventeen novel molecules by combining in the structures two chromophores: xanthone and (E)-cinnamoyl moiety. The ultraviolet spectroscopic properties of the tested compounds were confirmed in chloroform solutions. They acted as UVB or UVA/UVB absorbers. The most promising compound 9 (6-methoxy-9-oxo-9H-xanthen-2-yl)methyl (E)-3-(2,4-dimethoxyphenyl)acrylate) absorbed UV radiation in the range 290–369 nm. Its photoprotective activity and functional photostability were further evaluated after wet milling and incorporation in the cream base. This tested formulation with compound 9 possessed very beneficial UV protection parameters (SPF_{in vitro} of 19.69 ± 0.46 and UVA PF of 12.64 ± 0.32) which were similar as broad-spectrum UV filter tris-biphenyl triazine. Additionally, compound 9 was characterized by high values of critical wavelength (381 nm) and UVA/UVB ratio (0.830) thus it was a good candidate for broad-spectrum UV filter and it might protect skin against UVA-induced photoaging. Compound 9 were also shown to be photostable, non-cytotoxic at concentrations up to 50 µM when tested on five cell lines, and non-mutagenic in Ames test. It also possessed no estrogenic activity, according to the results of MCF-7 breast cancer model. Additionally, its favorable lipophilicity (miLogP = 5.62) does not predispose it to penetrate across the skin after topical application.     

Ultraviolet photoresponse of ZnO nanostructured AlGaN/GaN HEMTs

We present the first active visible blind ultraviolet (UV) photodetector based on zinc oxide (ZnO) nanostructured AlGaN/GaN high electron mobility transistors (HEMTs). The ZnO nanorods (NRs) are selectively grown on the gate area by using hydrothermal method. It is shown that ZnO nanorod (NR)-gated UV detectors exhibit much superior performance in terms of response speed and recovery time to those of seed-layer-gated detectors. It is also found that the best response speed (~10 and~190 ms) and responsivity (~1.1×10⁵ A/W) were observed from detectors of the shortest gate length of 2 µm among our NR-gated devices of three different gate dimensions, and this responsivity is about one order higher than the best performance of ZnO NR-based UV detectors reported to date.     

Spark Parameter Monitoring Feedback System for Preparation of Nanosilver Colloid in EDM

This study developed a system monitoring the electric discharge machine's (EDM) discharge energy and success rate to replace conventional oscilloscope observation. By using logic circuit, the signals are transmitted to the PC monitoring platform in order to display the discharge success times, discharge success rate, and electrode's consumption energy. The advantage of the proposed system is the capability to observe real-time discharges and record the experimental conditions, as well as optimize the discharge parameter settings. The experimental results suggest that, in the preparation of nanosilver colloid, the cost-performance of T_on–T_off at 10–100 µs is the optimal setting. The monitoring system also can take advantage of the discharge success rate to control the energy consumption of the electrode to obtain the standardization of products. The results suggest that, while discharge success rate, electrode's weight loss and wavelength of the absorption peak are considerably accurate, but concentration accuracy is relatively poor. The discharge success rate monitoring system is an innovative method that can help to realize electric discharge processing, optimize product quality, and it may be a powerful processing tool in the future.     

The utilization of carbon nitride to reinforce the mechanical and thermal properties of UV-curable waterborne polyurethane acrylate coatings

The waterborne polyurethane-acrylate (WPUA and Wsi-PUA) oligomers were prepared by anionic self-emulsifying method, using isophorone diisocyanate (IPDI), polyethylene glycol (PEG), dimethylol propionic acid (DMPA), vinyl hydroxyl silicone oil (VHSO) and hydroxyethyl methyl acrylate (HEMA) as raw materials. Then, a series of UV-curable waterborne Wsi-PUA–C₃N₄ composites containing different content of g-C₃N₄ were obtained with oligomer and photoinitiator Darocur 1173. FTIR, XRD, TEM, SEM, and TGA were employed to investigate the structure, morphology and thermal property of the Wsi-PUA–C₃N₄ composite films. The effect of g-C₃N₄ content on the performance was also investigated. The mechanical performance, water resistance and gel content of UV-PUA films were measured. It was found that with g-C₃N₄ particle was introduced into Wsi-PUA oligomer, the hardness, tensile strength, gel content, water resistance and thermal stability of composite films were significantly augmented. Moreover, when the content of g-C₃N₄ was 1.0 wt.%, the UV-curable film had the best mechanical property. The obtained composite is promising for a number of applications, e.g., for protecting the surfaces of metal and wood.     

用于飞秒激光制备光纤光栅的相位掩模研制

利用严格耦合波理论分析了用于520 nm波长飞秒激光制备光纤光栅的相位掩模的衍射特性,当相位掩模是矩形槽形时,占宽比在0.32~0.43之间,槽形深度在0.57~0.67μm之间时,能够保证零级衍射效率抑制在2%以内,同时±1级的衍射效率大于35%。在此基础上,利用全息光刻-离子束刻蚀技术,制作了用于520 nm波长飞秒激光的周期为1067 nm、有效面积大于40 mm×30 mm的相位掩模。实际制作的相位掩模是梯形槽形,槽深是0.665μm,分析了梯形槽形中梯形角对衍射效率的影响。实验测量表明,该相位掩模的零级衍射效率小于2%,±1级衍射效率大于40%,满足飞秒激光制作光纤光栅的需要。